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ANSTO's research capabilities, led by the OPAL nuclear research reactor and associated instruments provide access to users investigating areas as diverse as materials, life sciences, climate change and mining/engineering.

IBA Analytical Capabilities

 
When an energetic ion beam hits a sample it will interact with the atoms through a number of very complex interactions.
 
Some of the interactions and associated IBA techniques performed at ANSTO are listed below, and are schematically shown with the animations. To find more about a specific technique click on the links in the tables below.
 

Particle Induced X-ray Emission (PIXE)

 
Interaction: Characteristic X-rays are induced via interaction of the incident ions with the electron cloud
 

    

Rutherford Backscattering (RBS) 

 
Interaction: the incident ions are back-scattered from the atoms nucleus 
  

 

Particle Induced Gamma Emission (PIGE)

  
Interaction: Characteristic gamma rays are induced via interaction of the incident ions with the atom's nucleus
 

 

Elastic Recoil Detection (ERD & RToF)

  
Interaction: The target atoms are knocked and recoiled in the forward direction
 

    
By detecting and measuring the reaction products resulting from the various interactions and their intensities, quantitative data on the sample's constituent elements and their spatial distributions can be readily obtained. Depending on the technique used and the sample under investigation, probing depths are in the range 5 nm to 100 mm, and elemental sensitivities are typically of the order 1 to 100 ppm by weight.
 
The outline of the experimental set-up used at ANSTO's IBA laboratory is shown in the figure below. Depicted on this figure are the positions of the PIXE, RBS, PIGE and PESA detectors, which are complementary and often used simultaneously to extend the range of analysed elements

 

 

Analytical TechniqueTypical ApplicationsElements DetectedSensitivity
Depth Resolution
Analysis Depth

RBS

Surface and thin film composition and thickness.Li - U

Best for heavy elements on light element substrate (eg Cu on Si) typical 10% (Li) - 0.001% (U)

 

5-20 nmup to 1 mm
PIXETrace element composition of particulates and bulk materials.Si-U

Opimum near Fe (1ppm) elemental sensitivities range from 1 - 100ppm

 

typical proton range 20- 50 micronsup to 1 mm
PIGETrace element composition of particulates and bulk materials.Li-Al

Element dependent, typical
< 1 ppm for F
< 40 ppm for Na
< 40 ppm for Al

 

-up to 1 mm
NRA

Isotopic tracing and profiling in materials, surfaces and interfaces.

 

H-SiElement dependent, typically in range 1 - 100 ppm5-20 nmup to 1 mm
PESA

Hydrogen in polymers, polymer interdiffusion, hydrogen in solar cells.

 

H, D> 0.1%10-20 nmup to 1 mm
ERD & RToF

Elemental composition and structure of near surface regions. thin films.

 

H-U> 0.1 %10-20 nmup to 1 mm
 μPIXE

Trace element mapping in biological, environmental and geological samples.

 

Si-U> 100 ppm-up to 3 μm
μERDA

Elemental mapping and depth profiling in materials science.

 

H-U> 0.1 %> 50 nmup to 20 μm
 IBICCharge collection mapping in electronic devices and detectors.   up to 1 μm